半導體生產過程中需要用到大約40種氣體,如HF, nf3, BF 3, sicl4。所以輸送這些氣體的管道品質尤為重要,因為在納米細化工藝中使用的氟化氫所需99.9999999%的高純度。UHP(超高純度)管正好具有優異的耐腐蝕性和內部粗糙度以及必須的潔凈度。我司一直為我們的客戶供應半導體,醫藥,航空和精密機械等行業所需的較高內表面和潔凈度等無缺陷要求的不銹鋼高純管。
About 40 kinds of gas are used in semiconductor production processes such as HF, NF3, BF3, SiCl4。The quality of the gas transfer tube is very important because 99.999999999% high purity is required for hydrogen fluoride used in the Nano size fine process. Since UHP (Ultra High Purity) tubes with high corrosion resistance as well as good internal roughness and cleanliness are needed, has been supplying our customers in semiconductor, medical, aerospace, and precision measuring machines with excellent interior roughness and cleanliness。
產品數據Product Details:
生產工藝Process Method: Cold Drawn / Cold Roll& Bright Annealed & Electro polished
主要材質Available Material:
TP304L, TP316L, TP316L-S2, EN 1.4301, EN 1.4404, EN 1.4435, other grades can be offered on request.
Elements | 304L | 316L | 316L-S2 |
( C ) Carbon - max | 0.035 | 0.035 | 0.035 |
(Mn) Manganese-max | 2.00 | 2.00 | 2.00 |
(P) Phosphorus-max | 0.045 | 0.045 | 0.045 |
(S) Sulphur | 0.03 | 0.03 | 0.005-0.012 |
(Si) Silicon-max | 1 | 1 | 1 |
(Ni) Nickel | 8.0-12.0 | 10.0-14.0 | 10.0-14.0 |
(Cr) Chromium | 18.0-20.0 | 16.0-18.0 | 16.0-18.0 |
(Mo) Molybdenum | N/A | 2.0-3.0 | 2.0-3.0 |
標準Standards: ASTM A269, EN 10216-5 TC1
規格尺寸:
外徑Outside diameter range from 6.35-50.8mm
壁厚 Wall thickness range from 0.71-2.77mm
內表面粗糙度:Inner surface roughness can be according to customers' request and reach up to Ra<0.2μm
應用領域Applicable industries:
Semiconductor, microelectronics
Display industries (TFT/LCD, LED and OLED)
Gas/Bio/Medical Equipment
產品等級:
BA Ra<0.4μm
EP Ra<0.2μm